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Handbook of VLSI Microlithography : Principles, Technology and Applications

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Printing high density IC patterns with lithography

This book is a comprehensive guide to the technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatings. It covers the basics of resist technology and each alternative lithographic technique, including electron-beam and x-ray printing. If you're interested in IC chip production, especially in the DRAM industry, this book is a must-read. It explains the resist process and equipment parameters and their relationship, and offers an evaluation of basic metrology techniques and actual printing tools and their design, construction, and performance.

Note: While we do our best to ensure the accuracy of cover images, ISBNs may at times be reused for different editions of the same title which may hence appear as a different cover.
Sale

Handbook of VLSI Microlithography : Principles, Technology and Applications

Regular price Save up to 63%
Unit price
per
Compare to estimated retail price: RM250.00 MYR  
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ISBN: 9780815512813
Publisher: William Andrew
Date of Publication: 1991-01-15
Format: Hardcover
Related Collections: Science
Related Topics: Computers, Physics, Popular Science
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Description

This handbook gives readers a close look at the entire technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatings-- including optical lithography, electron beam, ion beam, and x-ray lithography. The book's main theme is the special printing process needed to achieve volume high density IC chip production, especially in the Dynamic Random Access Memory (DRAM) industry.The book leads off with a comparison of various lithography methods, covering the three major patterning parameters of line/space, resolution, line edge and pattern feature dimension control. The book's explanation of resist and resist process equipment technology may well be the first practical description of the relationship between the resist process and equipment parameters. The basics of resist technology are completely covered -- including an entire chapter on resist process defectivity and the potential yield limiting effect on device production.Each alternative lithographic technique and testing method is considered and basic metrology including optical, scanning-electron-microscope (SEM) techniques and electrical test devices, along with explanations of actual printing tools and their design, construction and performance. The editor devotes an entire chapter to today's sophisticated, complex electron-beam printers, and to the emerging x-ray printing technology now used in high-density CMOS devices. Energetic ion particle printing is a controllable, steerable technology that does not rely on resist, and occupies a final section of the handbook.
 

Printing high density IC patterns with lithography

This book is a comprehensive guide to the technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatings. It covers the basics of resist technology and each alternative lithographic technique, including electron-beam and x-ray printing. If you're interested in IC chip production, especially in the DRAM industry, this book is a must-read. It explains the resist process and equipment parameters and their relationship, and offers an evaluation of basic metrology techniques and actual printing tools and their design, construction, and performance.

Note: While we do our best to ensure the accuracy of cover images, ISBNs may at times be reused for different editions of the same title which may hence appear as a different cover.